Chinese company achieves photoresist breakthrough
A Chinese company has achieved a game-changing breakthrough in photoresist, a key material for semiconductor lithography machines, successfully passing mass production tests, according to officials from Optics Valley of China, a high-tech development zone in Wuhan, Hubei province.
The cutting-edge photoresist, dubbed as T150, achieves a stunning resolution of 120 nanometers in lithography, with greater tolerance, higher stability, and exceptional film retention after baking.
It was developed by Wuhan Taizi Micro Optoelectronics Technology Co Ltd, a company founded by a team from the Wuhan National Laboratory for Optoelectronics, of Huazhong University of Science and Technology.
The company also said their product works nicely with the post-etching process, offering superior sidewall verticality in dense patterns after etching, and that it is able to benchmark KrF, an industry-leading photoresist series.
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